'Etching of Si,Sio2,SiN and other materials' Video Lecture

Etching of Si,Sio2,SiN and other materials

  • Course: VLSI Technology
  • Discipline: Electronics and Communication Engineering
  • Faculty: Dr. Nandita Dasgupta
  • Institute: IIT Madras

    • NEXT LECTURE >> Plasma Deposition Process
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    Course Video Lectures Introduction on VLSI Design Bipolar Junction Transistor Fabrication MOSFET Fabrication for IC Crystal Structure of Si Crystal Structure contd Defects in Crystal + Crystal growth Crystal growth Contd + Epitaxy I Epitaxy II - Vapour phase Epitaxy Epitaxy III - Doping during Epitaxy Molecular beam Epitaxy Oxidation I - Kinetics of Oxidation Oxidation II Oxidation rate constants Oxidation III - Dopant Redistribution Oxidation IV - Oxide Charges Diffusion I - Theory of Diffusion Diffusion II - Infinite Source Diffusion III - Actual Doping Profiles Diffusion IV Diffusion Systems Ion - Implantation Process Ion - Implantation Process Annealing of Damages Masking during Implantation Lithography - I Lithography - II Wet Chemical Etching Dry Etching Plasma Etching Systems Etching of Si,Sio2,SiN and other materials Plasma Deposition Process Metallization - I Problems in Aluminium Metal contacts IC BJT - From junction isolation to LOCOS Problems in LOCOS + Trench isolation More about BJT Fabrication and Realization Circuits + Transistors in ECL Circuits MOSFET I - Metal gate vs. Self-aligned Poly-g.. MOSFET II Tailoring of Device Parameters CMOS Technology Latch - up in CMOS BICMOS Technology
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